skip to main content

Riley Surface World uses cookies to give you the best experience on our website. If you continue we assume that you consent to receive cookies on our website. Read More

X
Machines & equipment for sale

CPS Multi Function Wet Etching & immersion treatment Bench

Direct From Site Clearance

Price [?]
Please call on +44 (0) 1922 45 8000
Part of a Direct Site Clearance
Semiconductor and Diffusion Equipment
Condition
Seen working by RSW, Excellent Condition, Current Model
Stock No
TZ267
Manufacturer
CPS
Model
Laboratory Scale Treatments
Condition
Seen working by RSW, Excellent Condition, Current Model
Work Envelope (WxDxH mm) [?]
250 x 250 x 210 x 4 + 2 x500 x 260 x 210
Process Stages
6 Wet Stations
Other Info
See images. Extensive process support.
Location
Our Central Warehouse, Aldridge, UK
External Dimensions (WxDxH mm) [?]
1995 x 1360 x 2030

Description

CPS Wet Etching Bench

With many years of experience working in the Chemical and Process Industries, the CPS  Acid Etch Bench, consists of a 3 station wet cleaning and etching process, used in semiconductor manufacturing or other high technology products. 

Each station consists of an acid tank and DI (deionized) water in a rinsing tank. Used in multiple industries such as PV and Semiconductor wafer manufacture or other substrates, usually in multiple batch sizes are immersed in a predetermined sequence. 

De-Ionizing water supply is controlled from the front control panel, along with air sparge to tanks via Each station has a control panel which controls:

  • The supply of de-ionized water
  • The operation of an air sparge, which increases the efficiency of the wet etching process.
  • Solenoid activated tank drain. 

Bench fumes are managed by a common extraction ducting located at the rear of the bench

CPS Wet Benches are used in the manufacturing process of the following industries

  • Semiconductor
  • Solar
  • MEMS
  • LED
  • Bio-Medical
  • Disc Drive 

Applications

Cleaning and preparation

  • Examples: RCA clean, Standard clean (SC1 or SC 2), HF last

Etching

  • Etching films like Si, SiO2, doped silicate glass, Si3N4
  • Alkaline etching of crystalline using KOH, TMAH, EDP

Stripping

  • Photoresist and residue removal

Texturing

  • For solar cells and MEMS devices

Plating

  • Electroless and electrolytic applications
  • Chemistries include: copper, nickel, gold; more exotic requirements

 

pdf icon Print / Download CPS Multi Function Wet Etching & immersion treatment Bench Datasheet

Additional files

Photographs taken prior refurbishment. Our refurbishment service is not available on all machines.