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Machines & equipment for sale

Lamarflo Comprehensive Wet Etching Bench

Direct From Site Clearance

Price [?]
Please call on +44 (0) 1922 45 8000
Part of a Direct Site Clearance
Semiconductor and Diffusion Equipment
Condition
Seen working by RSW, Excellent Condition
Add to Quote Book Appointment
Stock No
TZ265
Manufacturer
Lamarflo
Model
Multi Function Wet Process Bench
Condition
Seen working by RSW, Excellent Condition
Work Envelope (WxDxH mm) [?]
Each stage 220 x 270 x 210
Process Stages
12
Other Info
Exceptional electronic industry standard
Location
Our Central Warehouse, Aldridge, UK
Weight (kgs)
560
External Dimensions (WxDxH mm) [?]
2715 x 1420 x 1970

Description

Lamarflo Wet Etching Bench

With many years of experience working in the Chemical and Process Industries, the Lamarflo  Acid Etch Bench, consists of a 6 station wet cleaning and etching process, used in semiconductor manufacturing or other high technology products. 

Each station consists of an acid tank and DI (de-ionized) water in a rinsing tank. Used in multiple industries such as PV and Semiconductor wafer manufacture or other substrates, usually in multiple batch sizes are immersed in a predetermined sequence.

Each station has a control panel which controls:

  • The supply of de-ionized water
  • The operation of an air sparge, which increases the efficiency of the wet etching process.
  • Solenoid activated tank drain. 
  • Water temperature

Bench fumes are managed by a common extraction ducting located at the rear of the bench, whilst de-ionized water quality is monitored by a Thornton 200CR Conductivity Resistivity Meter.

Features

  • Display: 1 line x 16 characters backlit LCD. 
  • Measurements: resistivity, conductivity, °C, °F, total dissolved solids, % rejection, difference and ratio, %HCl, %NaOH, % H2SO4. 
  • Measurement Channels: 2
  • Signal Inputs per channel: 2 (total of 4 signals for measurement).
  •  Measurement Cycle Time: 1 second (4 measurements processed per second). 
  • Configuration: all setup information is stored in non-volatile memory.
  • Setpoints (alarms): 4 independent alarms programmable as high or low limits. 
  • Relays: up to 4 with programmable delay time and hysteresis. 
  • Outputs: 2 analog outputs (4-20mA). Communications: RS232/RS422 interface, bidirectional. External isolation required if using 240-501 sensor. 
  • Calibration: complete instrument, output, and sensor calibration. 
  • Calibration can be NIST traceable. 
  • Watchdog Timer: with a power supply monitor, to prevent unexpected instrument lockup.
  •  Built-In Diagnostics: several self-tests performed automatically and can be initiated at any time.

Each station also has alarm indicators for drain and drum full conditions. There is also a visual and audible extraction system alarm status.

Larmaflo Wet Benches are used in the manufacturing process of the following industries

  • Semiconductor
  • Solar
  • MEMS
  • LED
  • Bio-Medical
  • Disc Drive 

Applications

Cleaning and preparation

  • Examples: RCA clean, Standard clean (SC1 or SC 2), HF last

Etching

  • Etching films like Si, SiO2, doped silicate glass, Si3N4
  • Alkaline etching of crystalline using KOH, TMAH, EDP

Stripping

  • Photoresist and residue removal

Texturing

  • For solar cells and MEMS devices

Plating

  • Electroless and electrolytic applications
  • Chemistries include: copper, nickel, gold; more exotic requirements

pdf icon Print / Download Lamarflo Comprehensive Wet Etching Bench Datasheet

Additional files

Extra data

Photographs taken prior refurbishment. Our refurbishment service is not available on all machines.